“By combining the computational lithography and manufacturing physics simulation capability in our Calibre portfolio with Canopus-AI’s advanced metrology and inspection technologies, we are creating a differentiated, end-to-end EDA digital thread that improves the fidelity of printed wafer patterns, accelerates yield ramp and reduces time-to-volume for advanced nodes,” says Siemens Digital CEO Tony Hemmelgarn.
EPE measurement
Mapbox-style viewer for CD-SEM
Founded in 2021 and based in Grenoble, Canopus AI developed ‘Metrospection’ to enhance metrology and inspection workflows with AI.
