A hyper-beam array lithography system has been introduced to the US, based on architecture pioneered in Europe. The lithography tool operates with 65,000 independently controlled parallel beams which delivers capabilities at a scale no electron beam technology can match, said the company. Installed at Northrup Grumann, it addresses the holy grail of chip design, said founder and CEO, Lex Keen. ...
HBA lithography tool ‘outstrips electron beam capabilities’
