{"id":889834,"date":"2026-02-24T06:24:56","date_gmt":"2026-02-24T06:24:56","guid":{"rendered":"https:\/\/www.electronicsweekly.com\/?p=889834"},"modified":"2026-02-24T10:03:30","modified_gmt":"2026-02-24T10:03:30","slug":"asml-1000w-light-source-to-deliver-330wph-euv-processing-by-2030","status":"publish","type":"post","link":"https:\/\/www.electronicsweekly.com\/news\/business\/asml-1000w-light-source-to-deliver-330wph-euv-processing-by-2030-2026-02\/","title":{"rendered":"ASML 1000W light source to deliver 330wph EUV processing by 2030"},"content":{"rendered":"<p>ASML has developed a 1000W light source which should increase the throughput of its high-NA EUV machine from 220wph to 330wph by 2030.<\/p><div class=\"elect-content\" style=\"margin-left: auto; margin-right: auto; text-align: center; \" id=\"elect-875610342\"><div id=\"x02\">\r\n<script type=\"text\/javascript\"> if ($(window).width() <= 768) { googletag.display('x02'); } <\/script>\r\n<\/div>\r\n<\/div>\n<p>The advance has been achieved by doubling the rate at which the molten tin drops in an EUV machine are exposed to a CO\u2082 laser beam to create plasma that emits EUV radiation.<\/p><div class=\"elect-test\" style=\"margin-left: auto; margin-right: auto; text-align: center; \" id=\"elect-1990099324\"><div id=\"DFP-EW-InRead1\">\r\n<script type=\"text\/javascript\"> if ($(window).width() > 768) { googletag.display('DFP-EW-InRead1'); } <\/script>\r\n<\/div>\r\n<BR>\r\n<\/div>\n<p>By doubling the droplet rate to 100,000 per second and using a two-pulse laser shaping approach instead of single pulse, the light source was boosted from 600W to 1000W.<\/p><div class=\"elect-post-content-2\" style=\"margin-left: auto; margin-right: auto; text-align: center; \" id=\"elect-632982106\"><div id=\"DFP-EW-InRead1-Mobile\">\r\n<script type=\"text\/javascript\"> if ($(window).width() <= 768) { googletag.display('DFP-EW-InRead1-Mobile'); } <\/script>\r\n<\/div>\r\n<\/div>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter wp-image-889840 size-full\" src=\"https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/02\/23185848\/IMG_1778.webp\" alt=\"ASML 1000W light source to deliver 330wph EUV processing by 2030\" width=\"800\" height=\"449\" srcset=\"https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/02\/23185848\/IMG_1778.webp 800w, https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/02\/23185848\/IMG_1778-300x168.webp 300w, https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/02\/23185848\/IMG_1778-768x431.webp 768w\" sizes=\"auto, (max-width: 800px) 100vw, 800px\" \/><\/p>\n<p>\u201cIt\u2019s not a parlour trick or something like this, where we demonstrate for a very short time that it can work,&#8221; Michael Purvis, ASML&#8217;s lead technologist for its EUV source light, told Reuters, \u201cit\u2019s\u00a0 system that can produce 1,000 watts under all the same requirements that you could see at a customer.\u201d<\/p>\n<p>ASMl sees a route to 1500W and then to 2000W.<\/p>\n<p>The company shipped eight high-NA machines last year at $380-400 million each, and intends to ramp production to 20 a year by 2027\/8.<\/p>\n<p><a rel=\"image\" href=\"https:\/\/www.electronicsweekly.com\/tag\/asml\/\" target=\"_blank\" rel=\"noopener\">See all our ASML content<\/a>.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>ASML has developed a 1000W light source which should increase the throughput of its high-NA EUV machine from 220wph to 330wph by 2030. The advance has been achieved by doubling &#8230;<\/p>\n","protected":false},"author":3,"featured_media":889840,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[16039,12663],"tags":[13930,14266],"class_list":["post-889834","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-business","category-manufacturing","tag-asml","tag-euv"],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v26.7 (Yoast SEO v27.2) - https:\/\/yoast.com\/product\/yoast-seo-premium-wordpress\/ -->\n<title>ASML 1000W light source to deliver 330wph EUV processing by 2030 | Electronics Weekly<\/title>\n<meta name=\"description\" content=\"ASML has developed a 1000W light source which should increase the throughput of its high-NA EUV machine from 220wph to 330wph by 2030. The advance has\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.electronicsweekly.com\/news\/business\/asml-1000w-light-source-to-deliver-330wph-euv-processing-by-2030-2026-02\/\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:title\" content=\"ASML 1000W light source to deliver 330wph EUV processing by 2030 | Electronics Weekly\" \/>\n<meta name=\"twitter:description\" content=\"ASML has developed a 1000W light source which should increase the throughput of its high-NA EUV machine from 220wph to 330wph by 2030. 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