{"id":891570,"date":"2026-03-20T06:22:14","date_gmt":"2026-03-20T06:22:14","guid":{"rendered":"https:\/\/www.electronicsweekly.com\/?p=891570"},"modified":"2026-03-24T14:01:47","modified_gmt":"2026-03-24T14:01:47","slug":"inec-gets-the-worlds-most-advance-litho-tool","status":"publish","type":"post","link":"https:\/\/www.electronicsweekly.com\/news\/business\/inec-gets-the-worlds-most-advance-litho-tool-2026-03\/","title":{"rendered":"Imec gets the world\u2019s most advanced litho tool"},"content":{"rendered":"<p>Imec has received the ASML EXE:5200 High NA EUV lithography system, said to be the most advanced lithography tool available today.<\/p><div class=\"elect-content\" style=\"margin-left: auto; margin-right: auto; text-align: center; \" id=\"elect-157230604\"><div id=\"x02\">\r\n<script type=\"text\/javascript\"> if ($(window).width() <= 768) { googletag.display('x02'); } <\/script>\r\n<\/div>\r\n<\/div>\n<p>The tool gives imec\u2019s partners early access to the next generation of chip-scaling technologies.<\/p><div class=\"elect-test\" style=\"margin-left: auto; margin-right: auto; text-align: center; \" id=\"elect-252382026\"><div id=\"DFP-EW-InRead1\">\r\n<script type=\"text\/javascript\"> if ($(window).width() > 768) { googletag.display('DFP-EW-InRead1'); } <\/script>\r\n<\/div>\r\n<BR>\r\n<\/div>\n<p>Integrated directly with a comprehensive suite of patterning and metrology tools and materials, the High NA EUV system will empower imec and its ecosystem partners to unlock the performance needed to pioneer sub-2nm logic and high-density memory technologies that will fuel the growth of advanced AI and high-performance computing.<\/p><div class=\"elect-post-content-2\" style=\"margin-left: auto; margin-right: auto; text-align: center; \" id=\"elect-1869706897\"><div id=\"DFP-EW-InRead1-Mobile\">\r\n<script type=\"text\/javascript\"> if ($(window).width() <= 768) { googletag.display('DFP-EW-InRead1-Mobile'); } <\/script>\r\n<\/div>\r\n<\/div>\n<p>\u201cThe past two years have marked an important chapter for High NA (0.55NA) EUV lithography, with imec and ASML joining forces with the ecosystem in its joint High NA EUV Lithography Lab in Veldhoven (The Netherlands) to pioneer High NA EUV technology,\u201d says imec CEO Luc Van den hove. \u201cWith the installation of the EXE:5200 High NA EUV lithography system into our 300mm cleanroom in Leuven (Belgium), we aim to bring these High NA EUV patterning technologies to an industry-relevant scale and to develop the next-generation High NA EUV patterning use cases. Its unmatched resolution, improved overlay performance, high throughput and a new wafer stocker that improves process stability and throughput will give our partners a decisive advantage in accelerating the development of sub-2nm chip technologies. As the industry moves into the \u00e5ngstr\u00f6m era, High NA EUV will be a cornerstone capability, and imec is proud to lead the way by offering its partners the earliest and most comprehensive access to this technology.\u201d<\/p>\n<p>This milestone is a key element of imec\u2019s five-year strategic partnership with ASML supported by the EU (Chips Joint Undertaking and IPCEI), the Flemish government and the Dutch government.<\/p>\n<p>\u201cAs an integral part of the EU-funded NanoIC pilot line, the tool is set to play a pivotal role in strengthening Europe\u2019s position as a leader in advanced semiconductor R&amp;D in the decades to come,\u201d adds Van den hove.<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" class=\"aligncenter wp-image-891571 size-full\" src=\"https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/03\/19150116\/IMG_1903.webp\" alt=\"Imec gets the world\u2019s most advanced litho tool\" width=\"1500\" height=\"844\" srcset=\"https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/03\/19150116\/IMG_1903.webp 1500w, https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/03\/19150116\/IMG_1903-300x169.webp 300w, https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/03\/19150116\/IMG_1903-1024x576.webp 1024w, https:\/\/static.electronicsweekly.com\/wp-content\/uploads\/2026\/03\/19150116\/IMG_1903-768x432.webp 768w\" sizes=\"auto, (max-width: 1500px) 100vw, 1500px\" \/><\/p>\n<p>Having the ASML EXE:5200 High NA EUV lithography system in imec\u2019s cleanroom firmly positions imec as the most comprehensive development environment for advanced patterning. Imec\u2019s deep ecosystem collaboration with leading chip manufacturers, equipment, material and resist suppliers, mask companies and metrology experts will allow it to ramp up learning cycles and enhance process stability to develop and demonstrate cutting-edge patterning for next generation logic and memory device technology, driving breakthroughs that will shape the future of advanced computing and AI in the years to come, claimed the company.<\/p>\n<p>Christophe Fouquet, CEO of ASML, added: \u201cImec\u2019s installation of the EXE:5200 marks an important step into the \u00e5ngstr\u00f6m era. Together, we\u2019re accelerating High NA EUV extendibility for the next generations of advanced memory and compute.\u201d<\/p>\n<p>Imec anticipates the EXE:5200 High NA EUV lithography system to be fully qualified by Q4 2026. In the meantime, the joint ASML-imec High NA EUV lithography Lab in Veldhoven will remain operational, ensuring continuity in the High NA EUV R&amp;D activities for imec and its ecosystem partners.<\/p>\n<p><a rel=\"image\" href=\"https:\/\/www.electronicsweekly.com\/news\/research-news\/\" target=\"_blank\" rel=\"noopener\">See all our Research content<\/a>.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Imec has received the ASML EXE:5200 High NA EUV lithography system, said to be the most advanced lithography tool available today. The tool gives imec\u2019s partners early access to the &#8230;<\/p>\n","protected":false},"author":3,"featured_media":891573,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[16039,12658],"tags":[14266,13144],"class_list":["post-891570","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-business","category-research-news","tag-euv","tag-imec"],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v26.7 (Yoast SEO v27.2) - https:\/\/yoast.com\/product\/yoast-seo-premium-wordpress\/ -->\n<title>Imec gets the world\u2019s most advanced litho tool | Electronics Weekly<\/title>\n<meta name=\"description\" content=\"Imec has received the ASML EXE:5200 High NA EUV lithography system, said to be the most advanced lithography tool available today. 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